Surface Area Calculation And Property Analysis Of Micro And Nano Structures Fabricated By Laser Interference Lithography

In the field of micro and nano fabrication, laser interference lithography technology has attracted the much attention of many researchers worldwide in recent years. It has the advantages of fabricating micro and nano surface structures with a wide range of potential applications. The most significant feature of micro and nano fabrication technology is the increase of unit surface areas of micro and nano structures, which has great impact on the properties of the materials. Chapter 1 introduces the state of the art of laser interference lithography technology and research plan of this report. Chapter 2 presents a new method for the calculation of the surface areas of micro and nano structures, and the method has been examined using AFM and SEM images. Chapter 3 introduces the principles of laser interference lithography. The simulation of different surface profiles was done using Matlab. Samples with different structures on polished single crystal silicon and iron-nickel alloy were fabricated by two-beam, three-beam and four-beam laser interference lithography. The surface structures of the samples were measured using the AFM, SEM and optical microscope, and the sample surface areas were calculated using the method proposed. Chapter 4 analyzes the impact of the increase of surface areas on the properties of materials. The sample’s reflectance, photoelectric conversion and hydrophobicity were measured using commercial or developed instruments.It is found that the larger of the surface area increased, the better of the anti-reflection performance, and the higher of the photoelectric conversion efficiency within a certain range of light energy. The hydrophobicity of the surface structure is closely related to the increase of the surface area. All of these are important for the analysis of the property changes of micro- and nano-structures.