Three-beam Lithography And Surface Structure Of Large-scale-testing

Laser interference nanolithography technology can be used to fabricate nano-scale surface structures. The system of laser interference nanolithography is simple without any expensive optical projection system, and it can be used to pattern photoresits using two-beam or multi-beam laser interference. Laser interference nanolithography can produce fine2D periodic patterns over large areas. It is a technology that can be widely used for the fabrication of photoelectronic and microelectronic devices. However, it is extremely difficult to pattern a large area of surface structures due to the lack of a real-time nano detection technology and the effect of environment and temperature on the process. In the area like the use of solar energy, the patterned surface structures can improve the efficiency. The increase of the conversion efficiency of solar panels is the basis for large scale industrial production when the fabricated surface structures are used for solar panels.This report studies new methods for the implementation of large area interference patterning and the matching of large areas using laser interference nanolithography based on the technological advantages of high resolution and low cost. In this work, surface structures are measured and characterized using atomic force microscope (AFM). The surface reflectance is measured and anylized.