Development Of Epitaxial Layer Process And Applications

As the technology of semiconductor and chip developed, we can’t live withoutsemiconductor materials in work and life. Not only these electronic consumableproducts like computer and mobile phone, but also the sophisticated technology likemedical and aviation, become Impossible to part with the semiconductor chips. Butour requirement about those electronic products to be increasingly as the societysteadily develop and improve, we want the mobile phone’s volume could be smallerand have more functions, computers could be more cheap while it’s speed be morefast, the technology’s motivation source is actually their all kinds of needs. Todaychip design require more strict quality chip substrate, when need manufacture morecomplex with high frequency and power’s devices, We need decrease the collectorseries resistance and the conduction voltage drop and the influence of factors such aspower consumption, epitaxial layer wafer is a kind more perfect substrate, it havemore uniformity and less surface defect than the original silicon chip substrate withelectrical properties can be controlled.Epitaxial layer position in the actual productionwill be increasingly important. How to control various parameters, are in theproduction of high-quality epitaxial layer to become extremely important issues.This article focuses on the epitaxial layer and relevant information, includingstatus of Epitaxial layers of semiconductors and the class of epitaxial layer technology,epitaxial layers’ effect and Epitaxial layers process. then focus on some mainparameters to the epitaxial layer influence in actual production. Also showed twoproblems in actual work, how to analysis and solved it.