The Research And Simulation Of MEMS Etching Process Model

In the 21 st century, the application of Micro-electro-mechanical-system(MEMS) devices is more and more extensive. To meet the market requirement, the demand of 3D micro structure design is higher and the device size needs to be smaller, which bring great difficulties to the improvement of etching process. In order to meet the requirements of device structure and size, and the analysis of device performance, the simulation research about etching process is very important. A variety of models have been proposed by the domestic and foreign scholars in the research of etching process. The characteristics of these models are different. Broader applicability, improved simulation accuracy and algorithm efficiency and more intuitive description of process are necessary for MEMS design and etching process.The sacrificial layer etching model and Cellular Automata model(CA model) are focused on in this paper. The model itself and algorithm are improved in research. In the research of sacrificial layer etching process, the influence of temperature is considered based on original two-dimensional corrosion model and the implementation algorithm is also improved. The language C and Matlab are used in programing and the output of graphics respectively. The simulation of different and complex sacrificial structures and the comparative analysis of experimental data and simulation data are implemented by using optimized program to verify the accuracy of the modified model. The lengthways etching simulation is also analyzed from several points of view. The research shows that the experimental results are consistent with the simulation results and the model has been further optimized to enhance the accuracy and the capabilities of corrosion contour output.The two-dimensional CA model is also analyzed particularly in the paper. The defect about corrosion profile asymmetry phenomenon of original model is discovered and solved through the simulation of transverse corrosion. In the process of algorithm implementation, the cells on etching boundary are handled effectively combined with dynamic cellular automata principle. The lengthways etching simulation about photoresist etching is also implemented in order to verify the great operational efficient, stability and the capacity of revealing corrosion profile of modified two-dimensional cellular automata model.