Preparing Of Silver Gate Array By Laser Interference And Optimization Design

The micro/nanoscale metal grates were prepared by the laser interference lithography induced chemical vapor deposition and the direct writing of laser interference lithography in this thesis. Firstly, the surface grating structure of solar cell was optimized by the simulation. While the grating features size is500nm, the power loss of the electrodes is lowest. Secondly, the striped array structures were simulated based on the basic principle of the interference using Matlab software for1064nm and266nm wavelength laser. The results showed that the different incident angle can be obtained when the different cycles of the gate and the gate electrode feature size. Finally, the micro-nanoscale silver arrays were obtained using laser interference lithography, laser-induced chemical vapor deposition, and interference lithography direct writing on Si (100) substrate, respectively. The1064nm laser was used to fabricate the silver array stripe in the experiment by adjusting the laser intensity, and that the results show the different feature size5μm,4μm and3μm, whereas, the feature size of400nm for the silver the array stripes was obtained by using the266nm laser.