| This dissertation studies the laser interference patterns formed by interfering beams incident from different directions to analyze the effect of the parameters such as incident angles, azimuthal angles, polarization states, light intensities and phases on the interference results. In this work,2D and3D intensity distributions were obtained by simulation of laser interference with multiple laser beams and different parameters. The optical setup was built based on the simulation results. In the setup, mirrors, beam splitters and beam expanders were used to form the interference patterns and a CCD was used to capture the images. The effects of different parameters on the nano scale interference patterns were analyzed and the equations were obtained showing the general variations of laser interference patterns. This approach contributes to the new development of the theory of laser interference for its use in lithography.This dissertation consists of five chapters. Chapter one is the introduction. It describes the working principles and potential applications of laser interference lithography. Chapter two introduces the laser interference intensity distributions formed by three, four and six interfering beams, and the equations are given. Chapter three describes the simulation of multi-beam interference,2D and3D results, and interference intensity curves. Chapter four introduces the system setup of laser interference and the capture of interference patterns to validate the simulation results. Chapter five is the conclusion. |
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