Research On The Limiting Feature Sizes Of Laser Interference Lithography

Lithography technology, as one of the most important manufacturing technologies for semiconductor devices, has attracted much attention and faced new challenges. Laser interference lithography has the advantages of simplicity, low cost, high resolution and large area processing, which can generate the line or dot periodic patterns.This report discusses the fabrication techniques and limiting feature sizes of laser interference lithography. In the work, a two-beam interference system was designed. The factors that affect the pattern feature sizes such as the wavelength, incident angles, polarization directions and energy densities were analyzed and simulated by computer. Selected analysis and simulation results were also experimentally verified. The limiting feature sizes of laser interference lithography were investigated by changing the variable of energy density.