The Study Of Nano-scale X-ray Diffraction Optical Elements

Since Roentgen discovered X-ray in1895, it has gradually attracted the attentions of the world’s scientists. Now, it has become an essential tool for scientific study and has a wide range of applications in the fields of energy, medical, aerospace and environment. When X-ray detection and analysis having become a hot issue in the field of aerospace, as the core components of the X-ray spectrometer, X-ray diffraction optical elements is becoming the important part of the field of nanofabrication. X-ray diffraction optical elements have a broad application in the field of the inertial confinement fusion, astronomical telescopes, synchrotron radiation and EUV lithography. But how to fabricate High resolution and high aspect ratio X-ray diffraction optical elements is a technical challenge of nanoscale fabrication process.On the basis of demand of the X-ray diffraction optical elements in synchrotron radiation and space exploration field, we try to fabrication a free-standing single order diffraction grating. This paper studied the technical questions and the solutions of fabricate a free-standing single order diffraction grating of the X-ray diffraction optical elements.The main content of this article include:First, we introduced the background, characteristics and application of the X-ray. On this basis, we introduced the classification of the X-ray diffraction optical elements and the device structure and performance of the X-ray diffraction grating. Corresponding with the ordinary X-ray diffraction grating, we propose a novel structure free-standing X-ray diffraction grating device and the advantages.Followed, we detailed introduced the background of a free-standing single order diffraction grating and analyzed the technical challenges of nanofabrication. After introduced the nano-scale processing technology, we proposed a hybrid fabrication process of electron-beam lithography, X-ray lithography, UV lithography and micro-electroplating process and successfully product it。Last, we Focus on the technical challenges and solutions of the free-standing X-ray single order diffraction grating fabrication process:The introduction of electron beam lithography and dose selection; The introduction of X-ray lithography and how to achieve indistinctive transfer of mask; ultraviolet lithography to produce a hollow structure; the problems and solutions of pattern transfer using micro-electroplating process. We also analysis the problems which need be taken attentions in etching process, electron beam evaporation process and silicon wet-etching process.