Contains Auxiliary Graph Model Of Opc Based On Process Window

AF (Assistant Feature) and OPC (Optical Proximity Correction) has developed to be a part of EDA framework, which primarily used to increase the achievable resolution and pattern transfer fidelity. And now it also serves to make contributions for DFM (Design for Manufacturability). Assistant Feature is kind of sub-pattern which used to enhance contrast and DOF of main pattern.This Dissertation aims to improve the accuracy of model-based OPC (MOPC) and process capability by introduction of AF.It is critical to find AF condition, which will enhance process window, before process condition fixed. To be moderate between speed and accuracy, we use simplified SRAF method, from which we obtain qualified AF condition to certain process.The process information of conventional MOPC focuses on optimal conditions, so the model can not predict accurately when the process conditions are changed, and should be built again. A major contribution of this dissertation is the development of process-window-based OPC model, off-target MOPC (PWMOPC). PWMOPC provides robust correction through the variations of process parameters. PWMOPC can cover the variations of process conditions within the process window, saving much time of data preparation before mask tape-out. Thus the cycle time of model construction is greatly shortened.