Font Size:
a
A
A
Keyword [Optical Proximity Correction]
Result: 1 - 20 | Page: 1 of 2
1.
Research On Computational Lithography For Nanometer-scale Circuits
2.
Research On Design And Verification For IC Manufacturability In Sub-Wavelength Lithography Circumstance
3.
Off-target Model-based OPC And OPC-relative Verifications
4.
Researches On OPC Methods Applied In The UDSM IC Manufacture And Verification Flow
5.
Research On Optical Lithography Simulation And DFM For Nano-scale Circuits
6.
Research On RET And DfM For Nano-scale Circuits
7.
Research On Verification And Design Technology Of VDSM IC Manufacturability
8.
An OPC-Friendly Maze Routing Algorithm
9.
Research On Resolution Enhancement Technology Of Nanometer-scale IC
10.
Polygon Matching And Comparison Analysis In OPC
11.
Research Of Double Patterning Technology Based On Optical Proximity Correction
12.
Research On Mask Data Preparation For 65nm Technology
13.
The Application Of Assist Feature In PWOPC Model And The Concept Of General OPC
14.
Transmission Of Ultra-deep Sub-micron Ic Lithography Process Imaging Studies
15.
Cell-based Optical Proximity Correction Technology
16.
Lithography Feasibility Tests And Its Optimization Method
17.
Research On Inverse Lithography Technology And Mask Complexity
18.
Research On RETs And Hotspot Detection For Nanometer-scale Circuits
19.
Contains Auxiliary Graph Model Of Opc Based On Process Window
20.
Based On The 32 Nm Lithography Dual Graphics Technology Research And Practice
<<First
<Prev
Next>
Last>>
Jump to
