Optical And Electrical Characterization Of NiO Thin Films Deposited By Magnetron Sputtering

Nickle oxide is a kind wide band-gap conducive oxide and p type conductive characteristic.It was considered as an attractive material due to its excellent chemical as well as electrical, optical and magnitic properties so be used in all kinds of displ ay.For example ultraviolet(U-V) detectors,functional layer material for chemical sens ors, electronchemical supercapacitors,organic light emitting diodes and so on.In this study we overview the properties,application and preparation methods of NiO films, RF magnitron sputtering has been most widely used in these methods and the dependences of thin films properties on all kinds of sputtering process.NiO thin films were deposited by RF magnetron sputtering process at different RF voltages, O2/A r,substrate temprature and substrate-target distance.In this paper, those properties of crystalline structure,optical,electrical were teste d by XRD-diffraction,UV-VIS spectrophotometer and four probe resistivity measurm ent.we show the conclusions in experiment.