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Study The Preparation And Propertis Of TiAlN Coating Deposited By Cathodic Vacuum Arc

Posted on:2012-10-20Degree:MasterType:Thesis
Country:ChinaCandidate:G J GaoFull Text:PDF
GTID:2210330338965935Subject:Physical Electronics
Abstract/Summary:PDF Full Text Request
The cathodic vacuum arc,as one of zhe physical vapourde position, it especially can be used to prepare metallic compound coatings or metal coatings with high melting Point on metal surface.TiAIN is a very promising material for wear resistant coatings because of its excellent high temperature corrosion and oxidation resistance which results in higher hardness and were resistance, in comparison to TiN.A series of titanium-aluminium-nitride (Ti-Al-N, multi-phase) films were deposited on silicon wafer and steel substrates by cathodic vacuum arc technique in N2/Ar2 gas mixtures and different negative bias voltages, using a compound Ti(50):Al(50) target. It was found that the microstructure and mechanical properties of the composite films were strongly dependent on the deposition parameters. The chemical composition, crystalline microstructure, film deposition rate and surface morphology of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscope (SEM) coupled with an energy dispersive X-ray analysis system (EDX), respectively. The hardness and Young's modulus, wear performance and corrosion behavior of the Ti-Al-N (multi-phase) films at different N2 partial pressure were analyzed and explained on the basis of microstructure, mechanical properties and wear mechanisms.
Keywords/Search Tags:cathodic vacuum arc film, bias negative bias voltages, TiAlN
PDF Full Text Request
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