Tft-lcd Manufacturing By Cvd And De To Improve The Interconnection Contact Hole Shape,

In TFT-LCD manufacturing process,we use the plasma enhanced chemical vapor deposition method(plasma enhanced chemical vapor deposition,PECVD) to grow the silicon nitride thin film,use the step-by-step approach to improve the deposition of silicon nitride etching perspective,also discussed the adoption of etching(dry etching) to improve the perspective of the possibility of etching silicon nitride has been produced with suitable etching silicon nitride film,etching a good taper of the suitable conditions.At the introduction of the new conditions,they can keep the transistor performance。at the same time,this new condition can avoid etching the shape unsuitable that make the products in trouble,the conditions have been used in mass production.