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Study On High Speed Photodetector Chips For Communications

Posted on:2013-09-14Degree:MasterType:Thesis
Country:ChinaCandidate:X ZhongFull Text:PDF
GTID:2268330425984653Subject:Communication and Information System
Abstract/Summary:PDF Full Text Request
In recent decades, photoelectron detector has been widely used in opticalcommunication, defense detection, signal processing, sensor systems, measurementsystems and other sophisticated scientific and technological fields. In thisinformation-oriented age, time is life. The demand of improving transmission rate hasbecome increasingly urgent. The research and development of high-speed photoelectrondetector never stop since it came up.This paper studied on the photoelectron detector and the associated manufacturingprocess technology. By combining the characteristics of the technology with the needsof the actual production process, the paper has designed a high-speed photoelectrondetector production process and validated it in the actual production process. Moreover,problems has been solved after analysing the issues in the production process andoptimizing technique parameters. After improving the design of high-speed photoelectrondetector chip test board, tests can be implemented to the finished chip by using this testboard. Test results show that the high-speed photoelectron detector chip can basically meetthe design requirements.The first chapter of this thesis proposed the necessity of research on high-speedphotoelectron detector chip after a brief introduction to the photodetector, the paper hasanalysed current situation and development trends of high-speed photoelectron detectordomestically and internationally; The second chapter introduced the principle of thephotoelectron detector and the performance parameters of measuring a photoelectrondetector. Meanwhile, improvements have been made after analysing the factors which mayaffect the parameters. Chapter three has introduced technology used in the process ofproducing a photoelectron detector chip and analysed the principles of the technology inaddition to its advantages and disadvantages; According to the architecture of thehigh-speed photoelectron detector chip, chapter four designed a process of producing ahigh-speed photoelectron detector chip by combining with the characteristics of each technology, Chapter five resolved the problems in the production process andoptimized the technology parameters. The result of testing the high-speed photoelectrondetector chip has proved that it can meet the demands of designing requirement. The lastchapter has given a summary of the full text.
Keywords/Search Tags:Photodetector, Lithography, Etching, Benzocyclobutene, PECVD (Plasma Enhanced Chemical Vapor Deposition), Magnetron sputtering
PDF Full Text Request
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