Minitab Phosphorus Expanding Knot Deep Consistency And Uniformity Of Data Analysis And Optimization

1N-type substrate diffusion process is the preparation of the common substrate technology, and it is widely used in transistors, MOS tube and other discrete devices in the craft. In this paper, we will discuss the following questions, such as the long production cycle length, consistency, poor reproducibility, low level of quality range on the workshop process. We analyze the possible causes in detail and propose solutions to the channel under the circumstances. By diffusion furnace equipment and process improvements, so that the spread of N-type substrate level of craftsmanship and quality leap breakthrough .This thesis include:1. In the current N-type substrate diffusion process, we have consistency and uniformity of the secondary distribution of the causes of poor analysis;2. Studied the causes why the temperature fluctuate in the test tube. Analysis of its causes, and based on the analysis, we improve the hardware of the diffusion furnace equipment, as far as possible to ensure the stability of the diffusion temperature;3. Changes the temperature of liquid phosphorus - phosphorus oxychloride, and changes the flow of the nitrogen for bringing the source. BY testing the sheet resistance, we analyze the effect. Also analyzed the effect including airflow direction and size, diffusion temperature, diffusion time on the proliferation of quality, choose the appropriate parameters.