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Research Design And Application On The Platform Of Printing And Dyeing Pattern Supported By Cscw

Posted on:2011-01-04Degree:MasterType:Thesis
Country:ChinaCandidate:T T LiangFull Text:PDF
GTID:2198330332964658Subject:Computer application technology
Abstract/Summary:PDF Full Text Request
The different and diversity is the key for building the competitive edge in Printing and Dyeing products. However, there are many small companies can't design the pattern by themselves now. Most of them can only modify the patterns which create by the designers. In order to solve the problem which the factories can't design by themselves, to solve the problem which the users can design and modify the pattern now and then, a platform which can meet their need is necessary. So researching and exploring the Printing and Dyeing platform is practical significanceWhat this task's research is Research, Design and Application on the Platform of Printing and Dyeing Pattern Supported By CSCW, it uses the system construction based on the web. System is designed to a three tier client and servers construction. You can do the cooperative design by download the paper and being checked by the system. The platform has the advantage of easy, opening and being explored etc. It solve the design single and separated problem of the Pattern and Dyeing. The paper finishes the platform at the first stage, and shows the process of the use's register, land and cooperate design through a example.The priority of this paper is the problem of conflict detecting and solution supported by CSCW. It suggests that the solve model based on instance speculate for different conflicts. At first, this model uses instance speculate strategy when the conflict happens. It searches the instance from the conflict instance warehouse. The similar simple which is found will be used to solve conflict. If it can't find the similar simple it will read the table of conflict divided and conflict ruler warehouse. Then use the related algorithm to solve. If it is a plan conflict we'll use backup strategy. If it is a knowledge conflict it'll uses the speculate strategy. If it is a date conflict it'll use reduce rules strategy. Finally it will be solved by the use the strategy of arbitrate if it still can't be solved. The model is proved to be effective through a conflict simple.
Keywords/Search Tags:Printing and Dyeing Pattern, CSCW, Conflict detecting and solution, design platform
PDF Full Text Request
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