The Design Of Electronic Control System Of The Great Travel Nano-imprint Lithography Machine

In recent years, with the rapid development of integrated circuits and microelectronic technology, manufacturing process is pressed from micron to nano level quickly, which creates the nano-imprint technology. Nano-imprint technology mainly includes HEL, UV-NIL andμCP. In this article, as based on the UV nano-imprint technology, we designed and implemented an electrical control system of a great-travel nano-imprint lithography machine. The device has features of high reliability, great travel, high precision, multi-posture, process automation etc., besides it is equipped with user-friendly operation interface.The entire electrical control system was designed as a combination of coarse and fine movements. The system used UV-curing to emboss materials and completed the two-dimensional nanometer-scale pattern imprinting.In "Electronic control system design of coarse positioning platform", we mainly described the design and complementation of 3-DOF coarse movement positioning system, which was based on AC servo motor and ball screw. The positioning system used pairs of encoder and optical grating to achieve a double-close-loop control, which greatly improve the precision to 2μm. In "Electronic control system design of fine positioning platform", we mainly described the design and implementation of a 6-DOF multi-pose fine positioning platform which was based on piezoelectric ceramic. The precision could be in 30nm. In this article, we described positioning system design, equipment composition, electrical control design, software design, man-machine interface, testing and optimization.In addition, we introduced the other related equipment in electrical control design, including UV light source, vacuum suction, high sensitivity multi-point pressure sensors and so on.Finally, we introduced the nano-imprint process control design. We improved and uniformed the nano-imprint process and developed the manual mode, semi-auto mode and auto mode control process. Within the auto mode, we complemented the nano-imprint, of which the testing result was satisfied.In the last chapter, we summarized the project results. We analyzed the difficulties and the corresponding solutions. In addition, we looked forward to the expansion of technologies and application prospects.