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Scanner Used In Lithography Of Low Accuracy

Posted on:2008-08-30Degree:MasterType:Thesis
Country:ChinaCandidate:D W DengFull Text:PDF
GTID:2178360215990158Subject:Instrument Science and Technology
Abstract/Summary:PDF Full Text Request
Technical progress and wide application have always been keeping the mask-based optical lithography in dominant position. While the representative maskless lithography based on direct scanning like the typical Electronic-Beam (E-B) lithography technology is just applied for special purpose such as the fabrication of special devices with high resolution in small quantity and masks for photolithography. However, in some circumstances, maskless lithography shows its some advantages due to the neglect of some factors which on the contrary are very important in domain of industry. But at present this kind of maskless lithography technology has not been taken into wide application. So the purpose of this thesis is to focus on the research of maskless lithography based on direct scanning.First of all this thesis introduces the typical lithography technologies and illustrates their technical features. After comparing differences between maskless lithography and mask-based lithography, the advantages of maskless lithography are emphasized. The working principle of E-B lithography as a typical maskless lithography is worth using. So the main scanning methods of E-B lithography system are thoroughly illustrated.In this thesis we try to utilize scanning of optical focused speckle to achieve photolithography with no mask at all. So we adopt raster-scanning method used in E-B lithography system. The only difference is scanning is achieved in a mechanical way. The precision of system based on mechanical scanning is much lower than that of mask-based lithography system. For the sake of micromation,high scanning frequency, we bring forward a few feasible design schemes and finally we want to try to make use of spring-based vibration structure to achieve scanning.Spring-based vibration structure and extrinsic motivation are most important two parts in an integrated scanning system and feasibility of this scanning system depends on the design of these two parts. Then a math model is built for Spring-based vibration structure to analyze its features which will guide the design of extrinsic motivation. As stated in this thesis, many problems are found which may cause the operation of this design unstable. In the end I summarize my advices for improvement...
Keywords/Search Tags:mask-based lithography, maskless lithography, E-B lithography, raster-scanning, Spring-based vibration structure, extrinsic motivation
PDF Full Text Request
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