Design Of Maskless Lithography Image System Based On DMD

With the rapid development of micro-electronic, micro-optics, and micro-mechanism, imperceptibly process technology is continually improved and ameliorated. Micro-optics devices are applied for most fields, likes communication, military affairs, space technology, exceed finish machining, information dispose, biology-physic and amusement consumption. It is result in that more and more people attach importance to design, execution and application technology relate to micro-optics.Micro-optics is prodigious developed on design theory and execution. For extend the application fields of micro-optics devices, there is more and more demand for its execution means. So, at present, it is a very important research field about micro-optics inside and outside that researching execution of convenient, efficiency, real time, flexible micro-optics devices. In this paper, it presents a design measure of maskless lithography imaging system based on DMD. It analysis the influence factors and error factor in this system in detail, and presents relevant resolvent. The central works are as follows:Firstly: Based on analyze the development status of lithography technologic at present, this paper demonstrate that design maskless lithography is necessary and urgently. Through analyze DMD, we obtain some require principle and key parameters.Secondly: Based on study the principle diffraction optics, this paper presents three different schemes about design the maskless lithography imaging system based on DMD, and validate the feasibility through experimentation. Compared the results of three schemes, and educe the most optimization and the optimization parameters of its key parts.Thirdly: Labouredly the mostly influence factors of maskless lithography, and give the equalize measures; labouredly the mostly error factors of this system, and give the resolvent idiographic.