Study And Analysis Of Point Defect In TFT-LCD Process

TFT-LCD display is a new photoelectric industrial with advanced technology. In short time it will replace CRT display thoroughly. At present exists the question is the production process is complex, in the production process not good has created high cost increase question. Main not good is some demonstration flaw question; its center point flaw is most serious. Through studies each system regulation link, analyzes flaw which possibly produces. And introduced emphatically the flaw production and the flaw examination way and the repair technique, simultaneously to repair the technique to have proposed the original improvement measure, the use cuts the ITO membrane to achieve the repair the goal, causes the repair the success ratio from 45% to enhance to 80%. Flaw formation mainly in front of Array section and Cell section, Array section in coating time can have some residuum's, if these residuum's the electric conduction or the area too are big, has created nearby it a short circuit or the abruption, this spot has become the luminescent spot perhaps the dim spot. Narrated the TFT-LCD system regulation process, as well as system in regulation descriptions and so on equipment parameter, introduced with emphasis the Array section coating and the Cell section fills the liquid crystal two system regulations, and analyzed these two system regulation to be able to cause a flaw the reason, thus through the increase examination station, or the adjustment appropriate parameter enhanced good rate, achieved reduced a flaw the goal. In the actual production has 5%~8% spot flaw, to these inevitable did the further research not good, the research had indicated they were may shoot through the radium are repaired or are desalinated. Therefore produces every year about 10,000,000 dollars about spot flaws not good to be possible to repair into good. Met down does the further research regarding the flaw examination radio station and the repair radio station to indicate the different cutting focal distance with cut the energy all to have the different effect regarding the repair different flaw. Uses two experimental plans, may solve in the production the radium to shoot two questions which the repair often meets-----The best focal distance should choose 5u or 6u, the best cutting Gate energy content should choose 7%, the best cutting Source energy content should choose 6%, the best cutting Welding energy content should choose 5%.The operation test result delivers the best parameter carries on the repair work, has promoted the repair greatly good rate, causes the radium to shoot the repair not not good basic is the zero. In the production process affects good rate and the efficiency factor are many, studies the good rate improvement method is only a very small part, but may by a generation of surface, reduce the cost regarding the enterprise, enhances produces good rate has the good model significance, and proposed the constructive plan regarding the flaw repair method----Cuts ITO, this to further will study a flaw to have the good reference value.