| Quartz crystal resonators are devices that supply standard time base. As their frequency are extremely stable, they usually are used as frequency control and standard. So they are not only important in army communication devices and research apparatus, but also are widely used in civilian. The manufacturing process of quartz crystal resonators has extreme effect on performances of resonators, so it is important to study and improve the process of manufacturing resonators. In manufacturing resonators, vacuum deposition technology is the key to frequency stableness. But this technology has disadvantages, such as controlling depth of films un-exactly. Therefore, it is necessary to improve the traditional manufacturing method and find a new way to advance the performance parameters of quartz crystal resonators.In this paper, it was analyzed the basic principle of pulse magnetron sputtering and aluminum films were deposited on a slice of quartz crystal successfully. At the same time, it was deeply analyzed the relationship between rate of deposition and sputtering parameters for the purpose of depositing some depth of aluminum films. As quartz crystal resonators have high requirements on thin films of electrodes, for the sake of high density and flat films, it is necessary to strictly control the sputtering parameters. Besides, the surface and roughness of aluminum films from direct current magnetron sputtering and pulse magnetron sputtering were compared. The relationship between films electrodes of quartz crystal resonators and equivalent parameters of resonators was analyzed. Then the method of designing electrodes was built and it is deeply analyzed the relationship between thickness of thin films electrodes and quartz crystal resonators. On this basis, it is successfully realized the adjustment frequency of quartz crystal resonators by use of pulse magnetron sputtering. |
