Research On Mask Data Preparation For 65nm Technology

The usage of resolution enhancement techniques (RET) has complicated the mask data preparation. The complications led to striking huge file size and mask manufacturing capability issue, especially in 65nm technology and below. This thesis presents the results of the research on new data format OASIS and mask data preparation flow to break through the bottle-neck of mask data storage, minimize the redundant operation and implement mask manufacturing rule check. Based on the results of the comparison research of data structures between GDSII and OASIS, the advantage of OASIS has been proven. According to the data conversion experiments from GDSII to OASIS, the correctness of OASIS has also been proven. Through the combination of previously independent steps of OPC operation, the number of internal files has been reduced to ease the restriction of mask data storage and the efficiency of data processing has also been improved. By adding OASIS based MRC operation in mask data preparation flow, the productivity of mask inspection machine has been improved by the guidance of MRC report, from which the operator can select proper inspection tool and proper inspection mode. Based on the research results above mentioned, a novel OASIS based mask data preparation configuration has been established to meet the data requirement of the high-end mask technology of 65nm and below.