Ti and TiO2 thin films were prepared by vacuum deposition on single crystal Si,SiO2 and glass substrates to obtain the thin films by heat-treatment in O2. Similarly, The TiO2 thin films Ce2O3 doped have been obtained on glass substrates by the same method. The effect of preparation, doping, substrate nature and annealing temperature on the structural electronic, optical and sensitive parameters was studied with XRD, SEM, EDC and electrical measurements.The results showed that the Ti thin films can be grown on glass substrates not to obtain the TiO2 thin films by making use of analytical pure Ti powder as an evaporation source at heat-treatment in large flux O2. So we need sometime to carry on the research work further. However, the analytical pure TiO2 powder can be used as an evaporation source under 500℃~800 ℃ of heat-treatment in large flux O2 to obtain the TiO2 thin... |