Research On Deposition Of Large Area Diamond Thin Film With HFCVD

Because the diamond has many special and superior performances, it has been a long time for human studying and hoping to full use it. In recent years, chemical vapor deposition diamond research has made great progress, and in some areas it has reached the practical stage. At the same time, diamond growth mechanism has also had some initial understanding. The law as a major hot-filament chemical vapor deposition of diamond HFCVD(hot-filament diamond thin film) has many advantages, such as the simple device, suitable for realizing the growth area, this work not only in theory but also in practical, are of great significance.In this paper the author first introduces the excellent various performance of diamond, and then lists diamond films briefed on the history and current situation, diamond film Preparation and Characterization of ways, the dynamics of diamond thin film growth factors. At last focuses on prepared by hot-filament large area diamond film deposition methods and devices, and the impact of factors such as the growth of thin films: types of carbon, carbon concentration, deposition pressure, temperature, substrate material, substrate handling, sedimentary time etc. Finally he found a rapid method of deposition large area diamond film with a simple hot-filament device.Experiments show that large area HFCVD in the conditions: filament substrate distance and 6.5 mm, acetone and hydrogen ratio of 0.75%, filament power of 6.0 kW, 1.5kPa furnace pressure, the growth time five hours, silicon substrate deposition to be a better quality diamond film, through observation and experiments we know that the film dense continuous and uniform. Boron-doped diamond large area in the electrochemical membrane has a good utility.