Research Of Planar Microstrip Spiral Inductively-Coupled Low-Power Microwave Plasma Source

Radio frequency/microwave inductively-coupled plasma (ICP) source has emerged since the early 1990s, which was researched more and more by community and scientists for superior performance. However, one developed the RF/microwave inductively coupled plasma technology so lately that the mature theory and designing methods are not given by far. With the rapid development of modern technology and MEMS technique, higher performance is required in the inductively-coupled plasma source (ICPS), so it becomes a focus and difficulty how to effectively design ICPS in ICP technology. In the paper, a planar microstrip spiral low-power microwave ICPS was analyzed in theory, the parameters of its equivalent circuit was calculated, and it was simulated using MATLAB and HFSS in order to obtain relationship which is caused by various parameters to the antenna's performance, especially to the quality factor Q; these parameters included turns n, microstrip line's width w, space between two turns s. The MATLAB simulation results showed that the n, w and s respectively have the best value, and the best values which made the quality factor Q to achieve maximum was different when the diameter of outside was not same. The two results were compared and validated, and the two kinds of conclusion was unanimous roughly. Finally a planar microstrip spiral ICPS antenna at 2.45GHz by microwave inspired is designed, the coil's diameter was 2mm, the total length was 3mm, the quality factor achieved over 800, which was characteristic of miniaturization and being integrated easily. It can provide the basis for excitation of long life, high-density and homogeneous plasma.