Photocatalysis And Hydrophilicity Study Of TiO₂ Films Prepared By Magnetron Sputtering

Titatium dioxide thin films with light-induced hudrophicility and photocatalysis characteric was used in many fields. There are a lot of methods to deposite TiO₂ films. The films which deposited by different method have corresponding property . The photocatalytic films and self -clean films were always deposited by sputtering, because the film prepared by sputtering was very compact and had well crystalline structure.We deposited TiO₂ films by DC magnetron sputtering method. Obtained films were characterized by UV-Vis,XRD and SEM, the photocatalytic activity of the films were investigated by measuring the photodegradation oxidation of rodamin B under UV irradiation conditon at last.Substrate temperature affects the crystallographic structure. we investigated the photocatalytic property of the films which were prepared at different substrate temperature, and found 400℃ was the optimum temperature. The films deposited at a relatively high sputtering-time had a better crystalline structure,large surface roughness and better photocatalytic property. The total sputtering pressure affected the sputtering rate, surface microstructure,crystalline perfect. Films prepared at larger sputtering pressure had low crystalline defects,so it had well photocatalytic property. Oxygen partial pressure was also an important factor, film of well crystalline structure should be deposited at large oxygen partial pressure.In order to improve the photocatalysis of the films, we deposited Ag-TiO₂ films by Magnetron co-sputtering. Ag grains have different surface shape on the TiO₂ surface. The photocatalytic property of the films prepared by co-sputtering had enhanced in certern condition.We tested the hydrophilicity of the TiO₂ films. All the films have hydrophilic property under UV irradiation conditon. The contact-angle between Ag-TiO₂ film deposited by co-sputtering and water became 5°when UV irradiated 5 min later.