The Application Research Of DOE In The Optimization Of Microelectronic Film Coating And Etching

This dissertation aims at the application study of DOE(design of experiment),taking the microelectronic film coating and etching process as examples. DOE,modeling and parameters optimization technique in the microcircuit manufacturing and design filed is studied.As the traditional method of determining condition relies on experience to adjust parameters, there may be some problems, such as too many times of experiments and too difficult to obtain the optimal condition. The basic application about DOE in the microcircuit process is summarized. The factorial effects estimation in design of experiment, analysis of variance and regression are illustrated by an example of factorial experiment. Through plasma etching processes, the application of screen experiment is introduced. For the thin-film coating process, statistical models of the process equipment are established by central composite design through 21 tests. And the actual verification of the validity of the models has been done. The models not only make the coating film thickness satisfy the requirements but also increase the uniformity of the film.