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Optimization Of The Structure Of Thin-film Integrated Magnetic And Research On Preparation Process

Posted on:2010-12-07Degree:MasterType:Thesis
Country:ChinaCandidate:W MengFull Text:PDF
GTID:2178330332462321Subject:Mechanical design and theory
Abstract/Summary:PDF Full Text Request
Magnetic integration is one important way to advance miniaturization of electronic systems, while the effective integration of magnetic can reduce the magnetic loss and improve the efficiency of electronic system machine. Combination of the thin film technology, MEMS process technology and magnetic integrated technology to produce an integrated magnetic, which is the only way for the future development of magnetic devices. This paper study the program of the Buck converter based on staggered parallel array of thin film integrated magnetic structure, and to use finite element analysis software to optimize the analysis, which provide technical support to the design of low-loss integrated magnetic; research the samples of magnetic thin film FeCuNbSiB and FeCoV created by vacuum magnetron sputtering. The crystal structure of samples was observed by using X-ray diffraction (XRD), Observation of deposited films after the cross-section structure and surface morphology by field emission scanning electron microscopy (FE-SEM), analysis of the sample composition by X-ray energy dispersive spectroscopy (EDX), using VSM test the static magnetic properties of sample. Test results show that the indicators of FeCuNbSiB film is superior to FeCoV film; using MEMS technology and magnetron sputtering technology to produce a kind of Array Integrated Magnetics, which constituted by the FeCuNbSiB. And give manufacturing process. And provide technical support to other programs of magnetic devices manufacturing.
Keywords/Search Tags:Integrated Magnetics, Finite Element Analysis, Magnetic Thin Film, magnetron sputtering, MEMS Manufacturing Technology
PDF Full Text Request
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