Study & Design Of Power Supply Applied In Plasma Deposition

As the development of electronic technology, the domain of the application of the electronic system is more and more widely, the kind of the electronic devices are more and more, the electronic devices are becoming increasingly close to the relationships between people's life and work. Any electronic devices need reliable power supply; their requirement to the power supply is more and more strict. In current society, rigidity of certain products is required at a certain extent, to reach this purpose, during the course of industrial production; some products need surface deposition in order to increase their abrading-resistance and scraping-resistance, Such as watches and the crust of the cell phone and aiguilles. In the domain of physics and chemistry, it is named surface property changing; some gases are at the state of plasma ionization under high electronic force in the vacuum stove, at certain air force and vacuum degree, so the produce in the vacuum stove is on the state of surface plasma ionization. The voltage force at a certain frequency, which is generated from a high frequency pulse power supply, is enforced to the two electrodes of the vacuum stove. The high frequency pulse power supply, which was researched and designed in the article, meets the requirement. The input of the power supply is three-phase 50Hz alternating current, which is rectified by the three-phase SCR and filtered by the large scale capacitors, and then it was inverted by means of full bridge and the voltage is boosted by the high frequency transformer; PWM and PID control method are adopted in the control circuit, so the high frequency rectangular wave which the device is needed is got. The sample met the planned design goal after theory research, schematic design, and experiment, but some aspects needs further progress and innovation.