| In this paper, several thin film samples of vanadium oxide were achieved with the method of vacuum evaporation and reaction R-F magnetron sputter, respectively high pure V2O5 powder as the source materials and metal vanadium as the target. In the experiments, the influence of some conditions such as temperature of substrate, proportion of Ar/O2, vacuum heat treatment on the characters of vanadium oxide thin film is mainly studied. To the evaporation deposition, it benefits forming thin film with good crystal in the case of increasing temperature of substrate properly, on the contrary, non-crystal thin film formed with lower temperature. With the analysis of XRD and XPS to samples which had been heat treated or not, it is concluded that vacuum heat treatment benefits forming of VO2. The resistance-temperature curves of thin film samples prepared by reaction R-F magnetron sputter show a step-down tend. It has a negative TCR and good thermal sensitive character. According to the demand of vanadium oxide thin film resistance, TCR should be controlled at about-2.3%/K.The resistance of thin films change observably between 0.04657 and 4086k(, and the change of content of samples is large, too. After the vacuum heat treatment to the samples made by the way of sputter, the following conclusions we can make:: In the side of content, vacuum heat treatment can make V2O5 deoxidize to VO2; in the side of electronic character, vacuum heat treatment can decrease thin film resistance and increase TCR; in the side of micro structure, vacuum heat treatment can make crystal grain regular and compact, and make defects lost.ï¼›To the vacuum heat treatment, higher temperature benefits forming regular crystal grain and better electronic character.
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