Preparation And Properties Of Vanadium Oxide Film By Magnetron Sputtering

The purpose of this thesis is to develop the space protection thin film material for the satellite or space craft defense in space. By using magnetron co-sputtering techniques, vanadium oxide films are deposited on quartz substrates with Ti or Al as dopants. The deposition conditions, such as pressure, temperature, carrier gas flow, and sputtering power, are optimized for the preparation of the films. We develop the new method of a kind of control thin film composition by using flux of Ar/O₂. The thermal and optical properties of the films, including the resistance- temperature dependence and the transmittance- wavelength dependence, are measured.The experimental results indicate that the thermal-Optical and electric properties of the Vanadium dioxide film change dramatically after the phase transition. The property of Ti-doped and Al-doped vanadium oxide film has strong thermal dependence. It is found that if Ti is doped in the vanadium oxide, the phase transition relaxation is narrowed, and if Al is doped, the transition temperature is lifted.