Design And Trial Manufactrue Of A XeCl Excimer Laser Pumped By Pulse Discharge And Study On Its Characters

The XeCl Excimer Laser have broad applications in industry manufacture, scientific research, biomedical engineering, nuclear fusion, photoelectron, semiconductor etc. Today, the excimer laser has been used in the serial of haloid excimer laser mainly, such as XeCl, KrF, XeF, ArF excimer laser. Due to great advantage of the Excimer Laser in photoelectron material, photoelectron technology research, so in this thesis, a XeCl excimer laser is designed in order to solve some problem in semiconductor film, CMR film, quartz film and other kind of film application, optical etching field, interaction between laser and material, material plasma study. The parameters of the excimer laser is e also measured and analyzed. The pulse duration time is 18ns, and the pulse energy is 120mJ, beam divergence angle is 3mrad, maxium repetition fequency is 5HZ.Firstly, the paper discusses the characters, principles of Excimer Laser, and study on pulse discharge process. Secondly, for the purpose of designing Excimer Laser, I spent a lot of time to researsh and finish electrode designing, reducing circuit inductance, spark gap designing, ns discharge, UV preionization, glow discharge. Finally we got a new Excimer Laser, which has simple structure, higher pump intensity, larger activate volume.At last we measure parameters of new Excimer Laser, the experimental measuring results show that our XeCl Excimer Laser has better characters, and its output is excellent compared to others. So it can be used in research work. The paper also analyses the development direction of Excimer Laser in the future.