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The Plasma Properties In Inductively Coupled Plasma Source With Crossing Antenna

Posted on:2009-09-23Degree:MasterType:Thesis
Country:ChinaCandidate:C S LuFull Text:PDF
GTID:2120360245465613Subject:Condensed matter physics
Abstract/Summary:PDF Full Text Request
A novel kind of inductively coupled plasma source (ICPs) with a crossing antenna hasbeen presented in this paper.The RF antenna were embedded into quartz tubes through thevacuum chamber.Uniformity and plasma properties of ICPs were diagnosed by LangmuirProbe technique,while intensity of Ar 750.4nm line of [4s'(1/2)0-4p'(1/2)] transition wasmeasured by optical emission spectroscopy,and variation of RF current through theantenna was measured by means of self-made Rogowski coil.Experiments indicate that the transition of E mode of the plasma to H mode happenswith the increase of RF input power and the emission intensity as well as RF currentincreased dramatically under H discharge mode.The RF current decreased with theincreasing of pressure because of the reduced conductivity.Electron temperature graduallyreduced with the increasing of pressure,however,has little influence of RF input power.Itwas also shown that this kind of source can generate high density plasma with itsuniformity better than 90% in the center region with the diameter of 120mm,the averageplasma density is 4.5×1016/m3.
Keywords/Search Tags:Inductively coupled plasma, Antenna, Langmuir Probe, OES
PDF Full Text Request
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