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Characteristics Of The Tuned Substrate Self-bias In A RF Inductively Coupled Plasma

Posted on:2006-04-01Degree:MasterType:Thesis
Country:ChinaCandidate:W G HuoFull Text:PDF
GTID:2120360152485284Subject:Plasma physics
Abstract/Summary:PDF Full Text Request
The research group first performs improvements on the experiment equipment. By means of adding the filter into the original grid circuit of RF power source, the ripple effect is reduced, and the stability of ICP is strengthened. The effect of matching network on capacitive coupling of plasma is studied. By comparing the measure, results with different discharge antennas, the better measurement means and conditions are found.Some improvements are performed on the capacitive coupling probe to increase its frequency range. In this case, it could measure the D. C. volts and RF volts respectively. We also study and modify the RF Langmuir probe. By adding tuning circuit, the interference of probe measurement caused by the 13. 56MHz signal is decreased. During the course of measurement, the problem of probe tine pollution caused by impurity in the vacuum room is resolved by software control, which is used to heat the probe tine. By this way, the probe could be used repeatedlyMore researches are done to study the impact of substrate embranchment resistance in series on substrate self-bias, and find the phenomenon of self- oscillation. We study the influence on the self-bias -tuning capacitor curve made by the axial place of substrate. We also study the substrate self-bias jumped delay, double-steady delay and self- oscillation etc with the condition of copper belt discharge antennas, and compare with datum which are obtained with the condition of red copper tube discharge antennas. By using the self-designed RF Langmuir probe, the electron temperature, the vertical and crosswise distribution of electron density as well as its variation with pressure, power and tuning substrate self-bias are measured. We use capacitive coupling to measure the spatial volts ofplasma with different discharge power and pressure., and get volts distribution of discharge antenna with these different conditions. The above researches provide necessary experimental datum for the future numeral imitation. Last, by using the theory of positive feedback and non-linear character of capacitor of substrate sheath combined by the relevant experimental datum and theoretical model, the phenomena of substrate self-bias jumped delay, double-steady and self- oscillation are explained .
Keywords/Search Tags:inductive coupling plasma, tuned substrate self-bias, RF Langmuir probe, capacitive probe
PDF Full Text Request
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