Design And Fabrication Of Three-dimensional Photon Crystals Based On Multilayer Dielectric Films

As new artificial materials the photonic crystals are made of periodic arrangement of dielectric or metallic structures. With the properties of photonic band gaps, photonic localization and negative refractivity, photonic crystals can control the propagation of light and have a promising application in many fields, such as optoelectronic integration, optical communication, and so on. Much work has been done both theoretically and experimentally on photonic crystals. The research in this thesis was focused on the fabrication of 3-D photonic crystals.Firstly, we designed multilayer dielectric films with different optical thickness based on the principle of transfer matrix method. The multilayer dielectric films can be regarded as one-dimension photonic crystals as they have different transitivity to different wavelength. According to the designed models we fabricated the one-dimension photonic crystals by an e-beam vacuum coating system. And the test results quite match our numerical simulations.Secondly, the plane-wave expansion and the finite difference time domain methods are used to analyze the photonic crystal band gap and simulate its optical field distribution, respectively. Besides, based on the simulation results from R-soft software, we find that the holes arrangement, lattice constant, and film refractivity have a great influence on the photonic crystal band gap and optical distribution. Considering these factors we design three different lithographic templates.At last, we fabricate the three-dimension photonic crystals by lithography with the different templates. We adjust many parameters of lithography to improve quality of the three-dimension photonic crystal. We use metallographic microscopy and atomic force microscopy to characterize the surface morphologies of photonic crystals. The results show that the 3-D photonic crystals we made are almost the same with our theoretical designs.