Study On Preparation Of Diamond Like-Carbon Film On Organically Modified Si Substrate And Its Tribological Properties

Diamond-like carbon film (DLC) and the deposition techniques, Filtered cathodic vacuum arc (FCVA) and microwave electron cyclotron resonance plasma chemical vapor deposition (MW-ECRCVD) are described briefly. The organic thin film/DLC hybrid films were fabricated on silicon substrates by FCVA and MW-ECRCVD so as to investigate the influence of organic interlayers, 3-Aminopropyl-triethoxysilane (APS) and N'-[3-(Trimethoxysilyl)-propyl]diethylenetriamine (TA), on the mechanical properties of DLC films.The properties and characters of organic/DLC hybrid thin films deposited by FCVA and MW-ECRCVD were evaluated by Raman spectroscopy, X-ray photoelectron spectroscopy, AFM, UMT. The main results were as follows:(1) Little difference in the structures was observed for the organic /DLC hybrid film and DLC thin film deposited by FCVA, and the poor tribological properties of DLC films were not improved by the addition of organic interlayer.(2) The roughness of the DLC films deposited by MW-ECRCVD was decreased from 0.198nm to 0.114nm as APS and TA self-assembled monolayer was added as interlayer. Moreover, sell-assembled monolayer APS highly increased the wear durability of DLC film from210s to 3.3×l0~4s, but the addition of TA interlayer weakened the wear life of DLC thin from 210s to 75s. Both APS and TA increased the hardness and Young's modulus of DLC thin films.