| Currently our understanding of film's magnetic property has come to a new level. It is because that the magnetic thin film has been widely used in memory devices, recording device and the other component of computers, rather than our interests about self-magnetization of binary-set objects. There are a lot of methods in producing films, including CVD, PVD and some other special methods.Firstly, in this paper we introduce that how to manufacture a plasma enhanced chemical vapor deposition (PECVD) set-up for preparing magnetic films, and that how to choose the precursor materials and how to design the gas input mode are also mentioned here. In the following, we illustrate the processing of making FeOOH film under different conditions by PECVD. Ferrocene was taken as the starting material and it was deposited on the ordinary glass as the substrate. The thickness of the film was measured by a step apparatus, and we explore the relationship between the film deposition rate and deposition processing. The surface of the thin film was measured by Scanning Electronic Microscopy (SEM) and Atomic force Microscopy (AFM). It is easy to see that the film is made of homogenous granules and it has the dense morphology without cracks. The chemical component of the thin film was measured on the Electron Spectroscopy for Chemical Analysis (ESCA or XPS). Not only the hysteresis loops of the film and the precursor ferrocene were observed by Superconducting Quantum Interference Device (SQUID), but also the relationship between the magnetic susceptibility and the temperature was observed on it. Considering all the conditions, we introduce a flow chart of using PECVD set-up and the proper processing parameter of preparation these films. It provides the experimental and theoretical preparation for the group to make the organic magnetic films in the future. All the results indicated that we could obtain ideal magnetic films by manipulating the deposition technology parameters.
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