| This thesis is divided into two parts. In the first part of the content, we make a simply introduction to the plasma concept and its application, and then mainly introduce the theories and equipment of the filtered cathodic arc plasma (FCAP) technique. In the practice use of the equipment, we made some modification, such as change the material of starting rod, add the baffle plate to filter the macroparticle. By this way, compared with the normal equipment, ours'have some special advantages, such as working in consecutively for a long time, ideal filtered effect, discharging automatically, and so on. In our experiment, we make good use of the peculiarity of FCAP to prepared the Diamond-like carbon film and the ZnO filmThe high quality DLC films were deposited successfully on the surface of silcon substrates at room temperature by the filtered cathodic arc plasma equipment. The result showed that the substrate bias play a crucial role in the sp3. component in DLC film and so affect the quality of the film;Analysis of AFM and IR spectrum demonstrated that the film were of typical characteristic of DLC. The DLC films have an excellent mechanical properties, which's hardness was 74.8pa and friction coefficient was 0.12-0.16, much better than substrate materials. Theoretical analysis for the film formation fitted well with experiment results.ZnO films were deposited on the glass substrate at a temperature of 200℃using the FCAP technique with the oxygen flow rate of 1.0, 3.0, 5.0, 7.0, 9.0, 10.0sccm. The deposition processes are only held in pure oxygen atmosphere. The as-grown films exhibit a polycrystalline hexagonal wurtzite structure. The small grain with a mean diameter of 13nm is observed by the field emission scanning election microscopy. According to the result from room temperature photoluminescence spectra measurement, the luminescent bands also depend on the oxygen supply.
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