Motion Model Of Dual-stage In ArF Immersion Lithography

As the core equipment for the microelectronics industry, the lithographic system drivenby Moore’s Law has experienced the history of close contact lithographic system,stepper, scanner, now it is entering the era of ArF immersion dual-stage lithographicsystem. In industrial production, a long time, stable, high-speed, and high-precisionexposure movement is needed, so it is the harsh demands of the overall performance ofthe lithographic system. Based on this, the cell technology for the step-and-scan motionmodel, focal control movement model and immersion lithography in ArF immersiondual-stage lithographic system was researched to upgrade the performance forlithography. It is hoped that a solid theoretical foundation would be established for ourArF immersion dual-stage lithographic system.The latest development trend in lithographic system and the detail of the ArF immersiondual-stage lithographic system was introduced in the beginning, and the research objectof this paper was fixed based on these. The step-and-scan motion model in ArFimmersion dual-stage lithographic system was studied: on the basis of the step-and-scanmotion mechanism, the coordinate system, the coordinate transformation, themathematical model for step-and-scan motion and the trace trajectory planning for itsmovement was studied carefully, and the experimental verification of synchronizedscanning movement was carried out. The control of the focal plane in ArF immersiondual-stage lithographic system was studied: the entire process of wafer map, surfacefitting of the wafer, defocus amount in exposure slit, decoupling algorithm for focusingand leveling, and the motion control algorithm for focusing and leveling was introducedand simulated lately. the immersion lithography was researched: based on the advantageof immersion lithography, the immersion sealing, the bubbles entrained in flow field andthe uniformity in flow field were focused on, also the theoretical analysis andsimulation analysis was carry out for them. Some related experimental was carried outsimultaneously. Finally, it was a summary for the paper, and the limitation and futureimprovement was pointed out.