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Patentometrics And Studies On Developing Model Of Patent

Posted on:2009-04-29Degree:DoctorType:Dissertation
Country:ChinaCandidate:C J LuanFull Text:PDF
GTID:1119360272470202Subject:Science of Science and Technology Management
Abstract/Summary:PDF Full Text Request
It is a more than 50 years that the theory and practice of constituting the model of patent development based on patentometric have been developed in some developed countries like United States and Japan. It needs a long process to develop the theory and practice of patentometric in China compared with that of abroad. Chinese patent law has been implemented since 1985, and the cognition of the function & value of patent law and patentometric waits to be improved higher by the thinkers, company managers, and policy-makers of Chinese government, and the practice of patentometric activities and constituting the model of patent development is still in initial stages. For Chinese government encouraging self-innovation and building innovative country vigorously, it should be enhanced to investigate the issue of establishing the model of patent development based on patentometric. Based on this, this paper brings forward the model of Chinese patent development by using the theory and methodology of patentometric based on a series of patentometric analysis, taking technology of digital information transmission (DIT) for example, and puts forward some suggestions of choosing the model of Chinese patent development and countermeasures in the domain of DIT.The paper uses patentometric methodology of country (territory) distribution of patent applications in DIT, and the results of patentometric of DIT shows that the patent centre has transferred from EU-Japan-EU-US during 1980-2006. The further analysis confirms that the main reason is the different models of patent development in EU, Japan, and US.The paper uses patentometric methodology of prolific institutions distribution of patent applications in DIT, and the patentometric results of institution distribution shows that the most prolific institution has transferred from Siemens AG- Fujitsu LTD-NEC CORP-LG Electronics INC- Matsushita Denki Sangyo KK- Samsung Electronics CO LTD; the prolific patent applicants and the countries where they gathered appear to be increasing; while the patent applications by academic institutions are mainly gathered in China, US, EU and Korea; and the productivity institutions of core patents have experienced from the stage of Japan and US go halves to the stage of US dominants. The model of patent development of productive institutions centralized in Japan, and the patent development of core patent in US, has affect the transfer of patent centre globally in DIT.The paper uses patentometric methodology of inventors collaboration of patent applications in DIT and the results shows that, the inventors' output has positively proportion compared with the centrality degree and density of collaborative network. The collaborative ratio and collaborative strength of foreign corporations are higher than that of Chinese. The high strength of patent collaboration in the corporations of US has significant impact on patent centre transferring.There's a good basic in terms of Chinese patent development. According to the experience of USA and Korea, and China should establish a kind of patent development model as "basic research-IPR protection-triple helix network construction". It means that basic research related should be strengthened, IPR protection should be enhanced, and the innovation network of university-industry-government should be highly emphasized. Government should go to its place according to its function and effect, and enterprise should exert its main body function of patent development, and patents in universities should be transferred highly.
Keywords/Search Tags:patentometric, transfer of patent centre, model of patent development, patent collaboration, core patent
PDF Full Text Request
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