Study On The Uniformity Of Vacuum Magnetron Sputtering System And Transmission Stability Of The Large Area Substrate

The development of information technology has increased the demand for display devices,and the substrate area is gradually increasing to improve the production efficiency.With the increase of substrate area,the existing vacuum magnetron sputtering system and transmission system are unable to meet the stability of sputtering of large area substrates.Therefore,based on large area substrates,this paper studies the distribution homogeneity of electromagnetic field of vacuum magnetron sputtering system,establishes the theoretical model and simulation model of electromagnetic field of magnetron sputtering,and analyzes the factors which affect distribution homogeneity of the electromagnetic field of the sputtering system.The problem that the existing substrate vertical drive system cannot drive the large area substrate stably is studied,the large area substrate tilt drive system is designed,the large area substrate tilt drive model is established,and the stability analysis of the large area substrate tilt drive method is carried out.The main contents are as follows.(1)The microscopic motion process of particles in sputtering is analyzed by using the particle collision theory,the breakdown voltage of the working gas and the position of the cathode sheath layer in the discharge interval is calculated.To analyze the generation process of plasma,a two-dimensional model of low-pressure glow discharge is established,and the variation curves of different parameters in low-pressure glow discharge process between target and substrate were obtained.The effects of applied voltage and working pressure on the gas discharge were studied to optimize the electric field distribution uniformity,and the relevant parameters with better uniformity of discharge between the two stages were obtained.(2)The magnetic charge integral method is used to establish the magnetic charge model of the inner magnetic strip and outer magnetic ring permanent magnets,and the magnetic induction intensity distribution between target and substrate was calculated,and the parameters of the permanent magnets was calculated.A three-dimensional model of the permanent magnet is established for magnetic field simulation to obtain the magnetic field distribution of the sputtering system.The intensity and uniformity of the magnetic field distribution of the sputtering system is optimized,and in the straight channel region of the magnetron sputtering target,the impact of the poly magnetic permeability structure on the magnetic field distribution is researched,and the structural composition and parameters of the straight channel region of the magnetron sputtering target were obtained.Based on the determination of the structure and parameters of the straight channel area,the magnetic field distribution in the end effect area of the magnetron sputtering target is analyzed,and the influence of the structure parameters of the inner magnetic strip and the outer magnetic ring on the magnetic field distribution in the end effect area is studied to optimize the uniformity of the magnetic field distribution in the end effect area.The particle flow deposition model is established by using the uneven etching on the target surface,the equation of film deposition thickness distribution was calculated,and the relationship between the film thickness distribution and target base distance was analyzed.(3)Aiming at the existing vertical drive system of the substrate,the magnetic force between the permanent magnets of the magnetic levitation positioning device and the impact load of the target atoms on the large-area substrate were calculated,the vertical drive model of large-area substrate was established,and the problem that the existing substrate vertical drive system cannot drive the large-area substrate stably was studied.The tilt transmission system large area substrate was designed,the tilt transmission model the large area substrate was established,and the maximum tilt angle of transmission system of the large area substrate was obtained through static analysis.The stability of large area substrate tilt transmission system was researched,the influence of tilt angle of large area substrate transmission system on the first sixth order vibration displacement of the transmission system was analyzed,and finally the tilt angle of large area substrate transmission system was determined.The chamber structure of the vacuum coating chamber is designed and a three-dimensional model of the vacuum magnetron sputtering chamber is established by using the relevant parameters of the large-area vacuum magnetron sputtering system and the large-area substrate tilt drive system.