| In recent years,transition metal trisulfides(MX 3)in low-dimensional materials have attracted extensive attention of researchers due to their unique chain-like structure,strong in-plane anisotropy,and novel physical and chemical properties.Zirconium trisulfide(ZrS3)is a typical representative of MX3,a p-type semiconductor with a wide photoresponsivity from ultraviolet(UV)to near-infrared(NIR),which is widely used in electronic devices such as field effect transistors(FET)and ultraviolet photodetectors.However,there are few reports on the origin of the in-plane anisotropy of ZrS3 and the interlayer coupling of the material,which is not conducive to further optimizing and improving the performance of ZrS 3 electronic devices.The economical and efficient synthesis of large-area ZrS3 films is the premise for ZrS3 to move from laboratory to industrialization.At present,two-dimensional ZrS3 nanosheets are mainly prepared by chemical vapor transport and liquid phase exfoliation,which is difficult to meet the needs of industrial production.Therefore,it is of great significance to explore a controllable and low-cost method to synthesis ZrS3 nanosheets.The chemical vapor deposition to prepare two-dimensional materials has the advantages of controllability and low cost,and is recognized as a reliable way to prepare high-quality two-dimensional materials.In this paper,ZrS 3 nanosheets were rapidly synthesized by chemical vapor deposition(CVD)using inexpensive ZrCl 4powder and S powder as reaction precursors,and the effects of changing the reaction temperature and different substrates on the material morphology were explored.The morphology of the material and the crystallinity of the crystal were determined by optical microscopy,Raman,TEM.The crystal anisotropy and interlayer coupling of the material were determined by angle-dependent polarization Raman spectroscopy and temperature-variable Raman spectroscopy.Using ZrS3 nanosheets as channel materials,FET were constructed to study their electrical properties.The Mo S 2-ZrS3heterojunction was constructed by dry transfer,and the optical properties of the heterojunction were tested.This work draws the following conclusions:(1)The morphology of ZrS3 nanosheets synthesized by chemical vapor deposition is greatly affected by temperature.As the reaction temperature increased,the nucleation sites for zirconium trisulfide and the size of ZrS3 nanosheets increased significantly.When the temperature is higher than 800℃,due to the influence of thermodynamic factors,ZrS3is transferred into ZrS2 nanosheets.Changing different growth substrates has no effect on the morphology of ZrS 3 nanosheets,indicating that the growth of ZrS 3nanosheets by chemical vapor deposition is not affected by the substrate.(2)XRD,HR-TEM and SAED prove that ZrS3 nanosheets have good crystallinity and no impurities are generated during the reaction process;XPS,EDS and EDS mapping show that the material is composed of Zr and S,wit h a ratio of about 1:3,and the two elements are evenly distributed.(3)Through the angle polarization Raman spectrometer,we can see that the two largest intensities of the Raman peaks of A3g,A5g and A6g are displayed at 45°and 225°(b-axis direction),indicating that the anisotropic ZrS 3 nanosheets.The period is 180°.Through the temperature-variable Raman test,it was found that with the increase of temperature,the Raman peak frequencies of the three visible peaks A3g,A5g and A6g all showed obvious red shifts.According to the linear fitting,the first-order temperature coefficients of Ag3,Ag5 and Ag6 were-0.01870 cm-1K-1、-0.02315 cm-1K-1、-0.01191cm-1K-1,indicating the weak interlayer interaction of ZrS3 nanosheets.(4)ZrS3 nanosheets were used as channel materials to construct FET,which exhibited p-type semiconductor characteristics,and the carrier mobility is 7.53×10-4 cm2V-1s-1.Monolayer MoS2 was synthesized by chemical vapor deposition,and MoS2-ZrS3heterojunction was constructed by PDMS dry transfer method.The Raman spectral peaks and Raman mapping indicate that the heterojuntion has good van der Waals contact. |