Research And Fabrication Of Complementary Multi-band Wide-angle Chromatography Filters For 3D Display System

Since its inception,3D display technology has been receiving extensive attention and gradually integrated into people's lives.With the continuous development,the application of3D display technology in many fields,such as film and television entertainment,medical imaging,and intelligent driving,is becoming more and more perfect.People have higher and higher demands for the realism,low crosstalk,and large field of view of 3D display technology.These demands are the driving force behind the development of 3D technology.In this paper,according to the use requirements of 3D display screen and the principle of wavelength division 3D display technology,a new type of complementary multi-band wide-angle chromatography filters are developed.The principle is to perceive subtle differences in image color by plating on two pieces of lenses with a narrow-band three-band-pass filter film with complementary pass bands in the visible light range to achieve a three-dimensional effect.The material of the spacer layer of the F-P filters is studied and replaced based on the thin film optical design theory.It is used to weaken the angle effect of S-light and P-light,so that the passband shift position of S-light and P-light under large-angle incident conditions are similar,which reduces the difficulty of subsequent optimization design.A fractal structure method is used to set the F-P structure,and adjust the position and width of the three passbands by changing the parameters.The regularity of the film structure is effectively improved,the physical thickness of the film layer is reduced,the sensitivity of the film thickness error is reduced,and the feasibility of preparation is improved.Analyze the discharge characteristics of the target material deposited by the intermediate frequency magnetron sputtering,select the appropriate target power,and optimize the process parameters of the glow discharge.The discharge characteristics of the Inductive Coupled Plasma equipment are experimentally studied,and the RF source power is determined according to its influence on the substrate temperature and the surface profile of the film.According to the characters of the target-mode conversion during the sputtering process,the amount of reactant gas in the ICP device is adjusted to obtain a single-layer film deposition process with stable deposition rate and high efficiency and sufficient material oxidation.Further adjust the amount of reaction gas inflated,analyze the results of the spectrum,to reduce the extinction coefficient of the Nb₂O₅material at short wavelength and increase the transmittance of the film.According to the environmental tolerance results,the process flow is optimized,a layer of SiO₂ is added as a primer layer before the main film system to improve the surface shape of the substrate,reduce the film stress,increase the film firmness,and make the films meet requirements.After testing,the average transmittance of the respective passbands of a couple of complementary three-band-pass filters developed is 92.25% and 92.97%,respectively.When receiving,there is no obvious color loss,which meets the color balance index and meets the design requirements of its application to the TV display.The films have passed a series of tests such as high-temperature boiling,salt spray humidity,and spectral stability to meet the needs of use.