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Design of a monitoring system for a plasma cleaning machine

Posted on:1999-01-20Degree:M.SType:Thesis
University:University of North TexasCandidate:Fooks, Terry MaxFull Text:PDF
GTID:2462390014972824Subject:Engineering
Abstract/Summary:
Plasma cleaning is the most effective dry process to remove surface contaminates from a SAW (Surface Acoustical Wave) device. Consistent gas pressures, flows, and good electrical connections between the chamber shelves are necessary for the process to function predictably. In addition, operation of the monitoring system must be transparent to the plasma cleaning unit. This Thesis describes a simple solution to the complex problem of monitoring a plasma cleaning system. The monitoring system uses the LabVIEW...
Keywords/Search Tags:Plasma cleaning, Monitoring system
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