| With advances in fabrication techniques, it is becoming possible to tap into low dimensional physics of materials, and the favorable characteristics exhibited by these at quantum scales, for applications in devices in general. Device applications range from electrical, optical, mechanical, to chemical and biological. Confinement in one, two or three dimensions, are achieved in quantum wells, wires and dots, respectively. These structures each have their own advantages in fabrication and trade offs with respect to the cost in fabrication convenience, and relevant applications. This thesis presents a previously developed multilayer alumina template, and optimizes the template for quantum wire and dot fabrication. Issues such as structural integrity, material quality, and reproducibility of fabrication results are improved upon for tech transfer purposes, and for scaling up to industrial size wafers. The resultant template is shown to be an excellent host for electrodeposition for semiconductors and metals. An overview of nanowire device applications is presented, with some background of the physics involved, and simulation results describing quantum wire infrared photodetectors, based on the same. This is followed by a general description of aluminum anodization and the newly developed multilayer template that has desirable characteristics as a host for quantum wire fabrication. Lastly, quantum wire and quantum dot fabrication results are outlined. Characterization of the electrodeposited material is described, with favorable results depicting quantum confinement effects in the structures grown. |
