Research On The Application Of The Improved Photoresist Transmission And Color Gamut

As is one of the most critical components for thin-film transistor liquid crystal display(TFT-LCD)to achieve colorful display panel,color filers have specific advantages of high transmittance,high color gamut,remarkable light resistance,and excellent chemical resistance.Color photoresist acts as the colorant for color filter,which is typically regarded as the most important material for color filter.In principal,the performance of color filter can be improved upon improving the overall performance of color photoresist.Generally,color photoresist is composed with alkali-soluble resins,monomers,pigments,photoinitiators,organic solvents,and additives.Here we systematically studied the detailed processing conditions of color filters based on high transmittance and high color saturated color photoresist.We also studied the product problems encountered in the process of preparing color filters,and explored solutions of such issues.Finally,we have applied the developed color resistance to the production line.In combination with the practical production specifications,and according to the principle and method of improving the color filter's transmittance and color saturation,we have developed a new color resist upon the collaboration with the photoresist supplier.The characteristic test of the developed color resistance indicates that the color resistance has good chemical resistance,high temperature resistance,stability,solubility,adhesion,etc.,and meets the production specifications.In the following step,we have thoroughly studied the process parameters of color filters prepared by using this color photoresist.The processing of such color filter includes coating,vacuum drying,pre-baking,exposure,development,and post-baking.We thoroughly discussed and verified the effects of these process parameters on the color resist film thickness,pixel line width,and Taper angle.According to the experimental results,we find that the film thickness increases by 0.01?m upon increases of the photoresist discharge amount by about 519?L;the pixel line width increases by 1?m upon increase the exposure distance of approximately 25?m;the pixel line width increases by 0.5?m upon increase exposure energy by approximately 10 mJ/cm~2;the pixel line width decreases by 0.4?m upon increase development time of approximately 10 s;and the Taper The angle increases with the as the exposure energy.Through comprehensive analysis of the above experimental results,we obtained the optimal preparation process parameters.We have also addressed three typical problems that occurred when preparing color filters using this color resist,including pigment residue,poor peeling,and poor surface roughness of color resists.The analysis is carried out from both materials and processing conditions.For instance,regarding to poor color resistance peeling,we optimized the distribution ratio of monomers by controlling the UV cleaning feed rate in the range of 5600~5800 mm/min.We found that when the hydrophobic M6 component is added and M1:M6 is 1:1,the spalling can be reduced from 23 to 4.Aiming at the poor surface roughness of the color resist,we can improve it by increasing the proportion of the K1 component with high photo intensity in the photoinitiator.When the proportion of the photoinitiator was changed from 66:34(K1:K5)to80:20(K1:K5),the color resistance surface roughness improved from 7.3 mm to 3.9 mm.