| In this paper,a set of spectral image acquisition devices and signal processing methods during plasma etching are proposed.In order to observe the plasma processing in the micro manufacturing process,the sweep frequency of the acousto-optic tunable filter AOTF is used to obtain the spectrum at a specific wavelength,which combined with the high-resolution spectral data stream of the fiber spectrometer,we complete the optimization of the system resolution.In this paper,from the perspective of application research,through related research on hyperspectral technology,for the scene of signal collection during plasma processing,related work has been done in the integration of software and hardware systems.The specific work of this article is as follows:1.Complete the construction of the hardware platform,including the system device of the plasma reactor,the selection of each hardware module,the connection between the structural modules of the entire hardware system,the collection method and steps of the hardware system and the packaging of the entire hardware device2.Use the Labview program development environment developed by National Instruments(NI)to develop the industrial camera and the AOTF hyperspectral imager SDK,and integrate acquisition,parameter configuration function of the industrial camera and Frequency sweep function of AOTF hyperspectral imager.3.To deal with the two challenges of low image signal-to-noise ratio and severe reflected light inside the cavity encountered during the acquisition of hyperspectral signals,we carry out signal processing simply.At the same time,the reliability of the real-time acquisition instrument was verified.This article combines hyperspectral technology with the plasma processing,and uses relatively mature technology to deal with the problem of real-time collection of plasma spectral signals.The technical risk is small and field data that cannot be obtained by previous solutions is obtained.The application prospect is broad. |
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