Study On AMOLED Anode Layer Material And Process

Active-matrix organic light emitting diode?AMOLED?was expected to become the next generation of the flat panel display technology.The selection and preparation of AMOLED anode material affected the characteristics of OLED device significantly,but the relevant regular was still not very clear.In this paper,based on the ITO Flim as the basis of the anode conductive material and the film forming process were studied.First,The ITO deposition process parameters on ITO film characteristic were researched through the detailed,and the best ITO film deposition process were determined.Second,comparing by Ag film,ITO/Ag film with ITO/Ag/ITO film,anode film structure were determined.In addition,different top ITO film thickness were studying for the influence of OLED characteristics,finally top ITO film thickness were determined.Based on the 50nm ITO process of deposition experiment,the before and after annealed ITO RS and thickness average and uniformity was as examining index,and also the ITO process of deposition was conducted.The results showed that,when none H₂O and O₂,pressure was 0.3Pa,power was 10kw,anneal condition 220 degree per hour,the ITO RS and THK remained stable before and after anneal,so ITO deposition process had a good stability.After anneal,ITO RS average was 58?/?,THK average was 47nm,THK uniformity was 6%,all had the good uniformity.The ITO average and at 550nm wavelength transmittance were 89.15%and 88.78%,both meet the requirement of 87%transmittance.In the study of anode film structure design,first used of Ag anode film,it was found that the adhesion of Ag and base was not good;secondly,adopted ITO/Ag anode film,it was found that film RS significantly increased and Ag was oxidized after idle 1h.So ITO/Ag/ITO film structure was determined.Through the study of ITO/Ag/ITO deposition process,it was found that annealing could improve reflectivity of the anode film,but UV treatment had no influence on anode film reflectivity;the anode film was adopted by normal deposition process,the average of transmittance and at 550nm wavelength were 98.26%and 97.70%,RS uniformity was11%,THK uniformity was 9%,resistivity uniformity was 6%,the anode film has good film characteristics;top ITO film thickness had no influence on RS and Ra,when the top film thickness was 400A,OLED device lifetime significantly improved and achieved 200h.Through the study of anode material and process,structure of anode layer meet the requirement of the deposition process.The way of AMOLED volume production has the important reference,so it had great prospect and significance.