Study On EUV Lithography Contamination Control Technology And Experimental Platform Design

The rapid development of the integrated circuit promote the upgrading of the lithography machine.The Extreme Ultraviolet lithography Technology has been the best scheme of the Next Generation Lithography.Contamination control is the core of EUV technology,this thesis launches research on the impact of dynamic gas lock contamination suppression performance.We study the general law of dynamic gas lock in contamination control and verify its feasibility.The main work and conclusions of this paper are as follows:This thesis extracts the contamination control requirements from EUV lithography machine,and decompose the requirements to complete the design of the principle scheme;The experimental platform is divided into three modules: contamination and exposure module,wafer transfer module and atmosphere module base on modularization method,and we using Solidworks to complete the mechanical structure design;The experimental platform use two vacuum ways to meet the vacuum requirements,and improve its compactness.The dynamic gas lock has been designed base on the simulation results,and improve its contamination suppression effect.The Direct Simulation Monte Carlo method was used to analyze the inhibitory effect of hydrogen,helium,argon and nitrogen on the contamination gas base on the molecule hypothesis,and argon is the best cleaning gas;Studies have shown that clean gas flow and dynamic gas lock contamination suppression ratio satisfies a logarithmic relationship.with clean gas flow increasing,suppression rate also increases,but the speed rate slows down;The clean gas injection position close to the dynamic gas lock's outlet can effectively improve the dynamic gas lock's suppression rate,can also effectively improve the stability of the flow field.Through the simulation analysis,the feasibility of dynamic gas lock contamination control is verified,and the design parameters of the dynamic gas lock are given,which provide the theoretical basis for the structural design.The EUV Experimental platform designed in this thesis can do many experimentals and meet the design requirement.The experimental platform can improve the working environment for the EUV.The design and research work of EUV equipment has filled the domestic technical gap,can provide the relevant design and reseach basis.