The Calculation Of Electricmagnetic Field In The CCP Chamber And Study On Low Frequency Breakdown Problem

The plasma chamber is the core equipment of plasma processing technology.So the analysis of electromagnetic field in the chamber is of great significance to the design of the process chamber.The characteristics of a typical low frequency plasma chamber is the electromagnetic wave length is larger than the chamber in length.According this,this paper build a 2-D electrostatic plasma model for a typical PECVD(Plasma Enhanced Chemical Vapor Deposition).To verify the rationality of the 2-D simplified model,the comparison with the 3-D model is needed in the computation precision and computing time under four different cases.When the plasma chamber is large,and the excitation frequency is high as well.The traditional electrostatic theory cannot solve the electromagnetic problems in the plasma chamber any more.This paper studies the influence of the plasma density and the excitation on the CCP(Capacitively Coupled Plasma)chamber by using the full Maxwell equations.The traditional edge element method will lead to the null space problem of the double curl when the frequency is low.That makes the result misconvergence or even wrong.In order to eliminate the null space problem,the mixed finite element method is presented by introducing Lagrange multiplier to apply the constraint on electric field.By using the E-? mixed finite element method,the applicability of electromagnetic field solution in CCP chamber is extended.